On Monday July 6th, the nanoHUB will be intermittently unavailable due to scheduled maintenance. All tool sessions will be shut down early in the morning. Home directories and tools will be unavailable most of the day. We apologize for any inconvenience this may cause. close


Support Options

Submit a Support Ticket



PVD Sputterer #1

Equipment home > Deposition > PVD Sputterer #1

General Information:

Coral Name: Metal/di-electric sputtering system
FIC: Joerg Appenzeller
Process/Equipment Owner: Dave Lubelski
Location: Cleanroom Bay S
Max Wafer Size: 4

System Information:

General Description:

Magnetic Sputtering


DC/RF sputtering capable, 2" targets, base pressure 5x10-6torr, materials include: ta, Ru, Mg), Cu, W, NiFe, CoFeB, Mo

Materials Compatibility:

Au, Ti, Al, N, Al(1%Si), WSi4, TiO2, Al2O3, Si3N4, Mo

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.