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Pyrogenic Oxidation

Equipment home > Deposition > Pyrogenic Oxidation

General Information:

Coral Name: pyrogenic_oxidation
FIC: Shared
Process/Equipment Owner: Dan Hosler
Location: Cleanroom R Bay
Max Wafer Size: 3 inch (75 mm)

System Information:

General Description:

Thermal oxidation by pyrogenically combining O2 and H2.


~Process gases include Hydrogen, Oxygen, Nitrogen, and Argon.
~Able to achieve temperatures of 1100°C

Materials Compatibility:

Silicon substrates only


Due to cleanliness and contamination concerns, this furnace tube is limited use

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.