nanoHUB tools will be briefly unavailable due to scheduled host maintenance on Sunday, October 1st, 2017 between the hours of 7:00 am ET and 17:00 pm ET. All tool sessions will be expired. We apologize for any inconvenience. close
Coral Name: axic
Process/Equipment Owner: Sean Rinehart
Location: Cleanroom Bay R
Max Wafer Size: 8
A general-purpose Plasma Enhanced Chemical Vapor Deposition system for oxide and nitride deposition.
The system has following gases:
1- 10% Silane (SiH4)/balance N2
It accommodate up to 8" substrate or a variety of smaller substrate sizes.
Maximum RF power: 600W @ 13.56MHz
Maximum electrode temp: 300C
Minimum base pressure: 20 mTorr
* Must install Coral and be a trained user to reserve a slot on this system.