nanoHUB could be intermittently unavailable on 05/04 from 8:00 am – 1:00 pm (EST) for scheduled maintenance. All tool sessions will expire on 05/04 at 8:00 am (EST).


Support Options

Submit a Support Ticket




Equipment home > Deposition > Axic PECVD

General Information:

Coral Name: axic
FIC: Shared
Process/Equipment Owner: Sean Rinehart
Location: Cleanroom Bay R
Max Wafer Size: 8

System Information:

General Description:

A general-purpose Plasma Enhanced Chemical Vapor Deposition system for oxide and nitride deposition.


The system has following gases:

1- 10% Silane (SiH4)/balance N2
2- N2O
3- NH3
4- CF4
5- O2

It accommodate up to 8" substrate or a variety of smaller substrate sizes.

Maximum RF power: 600W @ 13.56MHz
Maximum electrode temp: 300C
Minimum base pressure: 20 mTorr

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.