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Parylene CVD

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General Information:

Coral Name: parylene_cvd_furnace
FIC: Babak Ziaie
Process/Equipment Owner: Sean Rinehart
Location: Cleanroom Bay D
Max Wafer Size: 8

System Information:

General Description:

The Parylene deposition system model 2010 is a vacuum system used for the vapor deposition of the Parylene polymer type C and N onto a variety of substrates. The coating is truly conformal. The system consists of Vaporizer, Pyrolysis main furnace, Deposition chamber, Cold trap, and Vacuum pump.
There are three main steps in the process:
Vaporizer:
Parylene is vaporized from its solid dimer phase inside the vaporizer.
Pyrolysis furnaces:
It's a high temperature furnace (> 600C) which converts the dimer to monomer phase.
Polymerization:
Polymerization happens at room temperature inside the chamber.
In summary, the system converts Parylene dimer to a gaseous monomer. Upon deposition the material polymerizes at room temperature onto the substrate. The coating thickness depends on the amount of dimer loaded in the vaporizer.

Capabilities:

Base pressure is less than 10-20 mTorr.

Typical Process Settings:
Type C:
Vapor Heater Temp.: 175C
Pyrolysis Heater Temp.: 690C
Chamber Gauge Temp.: 135C
Pressure: Base pressure + 15 Vacuum Units (~35 mTorr)
Deposition Rate: 5um/hour

Type N:
Vapor Heater Temp.: 160C
Pyrolysis Heater Temp.: 650C
Chamber Gauge Temp.: 135C
Pressure: Base pressure + 55 Vacuum Units (~60-75 mTorr)
Deposition Rate: 0.75um/hour

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.