nanoHUB could be intermittently unavailable on 05/04 from 8:00 am – 1:00 pm (EST) for scheduled maintenance. All tool sessions will expire on 05/04 at 8:00 am (EST).
Coral Name: JipelecRTA
Process/Equipment Owner: Dan Hosler
Location: Cleanroom R Bay
Max Wafer Size: 8 inch (200 mm)
The Jipelec RTA is a very powerful rapid thermal processing machine. The stainless steel cold wall chamber provides a very clean process environment. Small samples are placed on a 6" wafer holder. Temperature control depends upon your final steady state temperature. For temperature below 500°C, a thermocouple is used to control the temperature. For temperatures above 500C, and pyrometer is used.
~Capable of handling small chip samples as well as whole wafers up to 8 inch
~Temperature ramping rates can be as high as 300°C per second, although not recommended for process reproducibility
~Process gases include N2, O2, Ar, and Forming Gas
~Vacuum annealing capability down to 50 mTorr
~1000°C maximum steady state temperature
~5 minute maximum steady state time
Compatibility by chamber
Note: You must supply (and piranha clean) your own 6" silicon wafer as a sample holder for smaller samples
* Must install Coral and be a trained user to reserve a slot on this system.