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Nitride sputter system

Equipment home > Imaging > Nitride sputter system

General Information:

Coral Name: nitride_sputtering
FIC: Tim Sands
Process/Equipment Owner: Bivas Saha
Location: BRK 1217
Max Wafer Size: 2

System Information:

General Description:

* Versatile sputtering system for the deposition of metals and nitrides
* Manufacturer: PVD Products, Inc.

Capabilities:


* samples up to 2” diameter wafers
*max substrate temperature
- sapphire = 800°C
-silicon = 900°C
*targets
- four 2” magnetron sputter sources
-current available targets: Ag, Al, Co, Cr, Cu, Fe, Fe-Al, Ga, In, Mo, Sc, Ta, TaN, Ti, TiN, V, W, Zr, ZrN
*gases: Ar, N2, NH3
*power supplies
-three 500W DC power supplies
-one 13.54 MHz, 300W RF power supply
*chamber
-loadlock
-base pressure <8x10-8 Torr
-two quartz crystal monitors for in-situ thickness measurement

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.