Due to local system maintenance on Tuesday, September 27th, nanoHUB will be unable to launch simulation jobs on clusters conte, rice, carter, and hansen. We apologize for any inconvenience.

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Equipment

Suss MA 6 Mask Aligner

Equipment home > Patterning > Suss MA 6 Mask Aligner

General Information:

Coral Name: ma_6
FIC: David Janes
Process/Equipment Owner: Mike Courtney
Location: Cleanroom N Bay
Max Wafer Size: 6

System Information:

General Description:

The Suss MA 6 Aligner is designed for high resolution photolithography in a clean room environment. It offers unsurpassed flexibility in the handling of substrates of differing thickness, as well as standard 4 inch size wafers.

Notes:

With the Suss MA 6 operated manually, all contact exposure programs (vacuum, hard, soft,contact and proximity) are provided to print features far into the submicron range. X and Y shift are below 0.1 micron and not detectable by optical means. Wafers up to 6 mm thickness may be processed.

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* Must install Coral and be a trained user to reserve a slot on this system.