Due to local system maintenance on Tuesday, September 27th, nanoHUB will be unable to launch simulation jobs on clusters conte, rice, carter, and hansen. We apologize for any inconvenience.


Support Options

Submit a Support Ticket



Suss MA 6 Mask Aligner

Equipment home > Patterning > Suss MA 6 Mask Aligner

General Information:

Coral Name: ma_6
FIC: David Janes
Process/Equipment Owner: Mike Courtney
Location: Cleanroom N Bay
Max Wafer Size: 6

System Information:

General Description:

The Suss MA 6 Aligner is designed for high resolution photolithography in a clean room environment. It offers unsurpassed flexibility in the handling of substrates of differing thickness, as well as standard 4 inch size wafers.


With the Suss MA 6 operated manually, all contact exposure programs (vacuum, hard, soft,contact and proximity) are provided to print features far into the submicron range. X and Y shift are below 0.1 micron and not detectable by optical means. Wafers up to 6 mm thickness may be processed.

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.