Coral Name: nitric_oxide_anneal
Process/Equipment Owner: Dan Hosler
Location: Cleanroom P Bay
Max Wafer Size: 3 inch (75 mm)
Small bore, high temperature furnace for annealing silicon carbide.
~Process gases include Nitric Oxide, and Argon.
~Able to achieve temperatures of 1150°C
Due to cleanliness and contamination concerns, this furnace tube is limited use
* Must install Coral and be a trained user to reserve a slot on this system.