Due to local system maintenance on Tuesday, September 27th, nanoHUB will be unable to launch simulation jobs on clusters conte, rice, carter, and hansen. We apologize for any inconvenience.
Coral Name: nitric_oxide_anneal
Process/Equipment Owner: Dan Hosler
Location: Cleanroom P Bay
Max Wafer Size: 3 inch (75 mm)
Small bore, high temperature furnace for annealing silicon carbide.
~Process gases include Nitric Oxide, and Argon.
~Able to achieve temperatures of 1150°C
Due to cleanliness and contamination concerns, this furnace tube is limited use
* Must install Coral and be a trained user to reserve a slot on this system.