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Equipment

Nitric Oxide Anneal

Equipment home > Patterning > Nitric Oxide Anneal

General Information:

Coral Name: nitric_oxide_anneal
FIC: Shared
Process/Equipment Owner: Dan Hosler
Location: Cleanroom P Bay
Max Wafer Size: 3 inch (75 mm)

System Information:

General Description:

Small bore, high temperature furnace for annealing silicon carbide.

Capabilities:

~Process gases include Nitric Oxide, and Argon.
~Able to achieve temperatures of 1150°C

Notes:

Due to cleanliness and contamination concerns, this furnace tube is limited use

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.