Due to local system maintenance on Tuesday, September 27th, nanoHUB will be unable to launch simulation jobs on clusters conte, rice, carter, and hansen. We apologize for any inconvenience.

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Equipment

Protemp Horizontal Furnaces

Equipment home > Thermal > Protemp Horizontal Furnaces

General Information:

Coral Name: Tube_02_Nitride_Dep Tube_03_LTO_Dep Tube_06_Polysilicon
FIC: Shared
Process/Equipment Owner: Dan Hosler
Location: Cleanroom R Bay
Max Wafer Size: 6 inch (150 mm)

System Information:

General Description:

Horizontal furnaces for a variety of processes.

Capabilities:

Processes Capabilities:
Tube 02 - LPCVD Nitride Deposition
Tube 03 - Low Temperature Oxide Deposition
Tube 06 - Polysilicon Deposition (not yet operational)


Process Temperatures:

Tube 02 - 800°C maximum
Tube 03 - 400°C maximum
Tube 06 - 650°C maximum



All furnace tubes are capable of samples up to 6 inches in diameter.

Materials Compatibility:

Check with particular tube

Useful Links:

* Must install Coral and be a trained user to reserve a slot on this system.