Due to local system maintenance on Tuesday, September 27th, nanoHUB will be unable to launch simulation jobs on clusters conte, rice, carter, and hansen. We apologize for any inconvenience.
Coral Name: Tube_02_Nitride_Dep
Process/Equipment Owner: Dan Hosler
Location: Cleanroom R Bay
Max Wafer Size: 6 inch (150 mm)
Horizontal furnaces for a variety of processes.
Tube 02 - LPCVD Nitride Deposition
Tube 03 - Low Temperature Oxide Deposition
Tube 06 - Polysilicon Deposition (not yet operational)
Tube 02 - 800°C maximum
Tube 03 - 400°C maximum
Tube 06 - 650°C maximum
All furnace tubes are capable of samples up to 6 inches in diameter.
Check with particular tube
* Must install Coral and be a trained user to reserve a slot on this system.