== Equipment ==

== Procedure ==
 # Mask Material: AZ1518,AZ9260 photoresist.
 # Etch Recipe: 
      # Power = 100W
      # SF,,6,, flow rate = 20sccm
      # Pressure = 100mT
      # SiO,,2,, etch rate = 100 Å/min
== Notes ==

== Safety Precautions ==

== Sources of Further Information ==