R. Fabian Pease is the William Ayer Professor of Electrical Engineering at Stanford University. He has been a professor at Stanford since 1978 and was appointed to his current position in 2001.
His group’s areas of research include micro- and nano-fabrication and their application to electronic and magnetic devices and structures. Among other achievements, this work has included the original demonstration of lithography with the scanning tunneling microscope and the invention of the micro-channel heat sink.
While on sabbatical in 1993 and 1994, Pease conducted research on the synthesis of DNA microarrays at Affymetrix Corporation. From 1996 to 1998, he was assigned to the Defense Advanced Research Projects Agency, where he initiated programs in advanced microelectronics and molecular-level printing. He has also served as a consultant to IBM, Xerox, Etec Systems, and Lawrence Livermore Labs, and is on the technical advisory boards of Ultratech Stepper and Affymetrix.
Pease is a fellow of the IEEE and has served the association in a variety of capacities. He is also a member of the National Academy of Engineering. With his student David Tuckerman, he received the fi rst IEEE Paul Rappaport Award. He received the IEEE Cledo Brunetti Award in 2001 for advancing high-resolution patterning technologies, high-performance thermal management, and scanning electron microscopy for microelectronics. His other honors include the Richard P. Feynman Prize for Microfabrication, which he shared with his student Tom Newman, for writing a page of text in a 6-micron square with 25 nm linewidths; and a Title A Fellowship from Trinity College, Cambridge. He has published more than 200 articles and authored several book chapters.
Pease holds BA, MA, and PhD degrees from Cambridge University. His PhD thesis was on high-resolution scanning electron microscopy. Earlier in his career, Pease served as a radar offi cer in the Royal Air Force and as an assistant professor of electrical engineering at UC Berkeley. He also served on the technical staff of Bell Laboratories, where he fi rst worked on digital television and later led a group that developed processes for electron beam lithographic mask manufacture, and demonstrated a pioneering LSI circuit built with electron beam lithography.