Illinois Tools: Nanofilm Lab

By Nahil Sobh1, Zuhaib Bashir Sheikh1

1. University of Illinois at Urbana-Champaign

Interaction of electromagnetic plane wave and nanoscale metallic film with subwavelength slit

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Version 1.2b - published on 31 Mar 2016

doi:10.4231/D3M32NB58 cite this

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Usage

World usage

Location of all "Illinois Tools: Nanofilm Lab" Users Since Its Posting

Simulation Users

130

14 17 19 19 22 22 26 27 30 32 32 36 38 39 39 40 41 41 43 44 45 45 48 51 54 56 57 60 60 61 62 62 65 67 69 70 70 70 72 72 73 73 75 75 76 77 77 79 80 83 85 86 88 90 94 97 98 99 101 102 104 104 105 107 108 110 111 112 115 116 116 118 118 118 118 118 120 121 121 122 122 122 123 128 128 129 129 130 130

Users By Organization Type
Type Users
Educational - University 82 (63.08%)
Unidentified 44 (33.85%)
Educational - Pre-College 2 (1.54%)
Unemployed 1 (0.77%)
National Lab 1 (0.77%)
Users by Country of Residence
Country Users
us UNITED STATES 32 (48.48%)
in INDIA 11 (16.67%)
cn CHINA 7 (10.61%)
de GERMANY 3 (4.55%)
tr TURKEY 3 (4.55%)
ru RUSSIAN FEDERATION 2 (3.03%)
ir IRAN, ISLAMIC REPUBLIC OF 2 (3.03%)
kr KOREA, REPUBLIC OF 2 (3.03%)
dz ALGERIA 2 (3.03%)
ro ROMANIA 2 (3.03%)

Simulation Runs

401

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Overview
Average Total
Wall Clock Time 2.89 hours 22.87 days
CPU time 12.17 minutes 1.61 days
Interaction Time 1.91 hours 15.11 days