Surface Analysis of Organic Monlayers Using FTIR and XPS
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Abstract
Current research concerning self-assembled monolayers (SAM) focuses on the fabrication of microelectronics utilizing a semiconductor/molecule/metal junction. This study seeks to investigate various experimental techniques for creation of organic monolayers by surface analysis techniques including fourier transmission infrared spectroscopy (FTIR) and x-ray photoelectron spectroscopy (XPS). The monolayers were formed by electrochemical reduction of diazonium salts on Si(111) and solution self-assembly of thiols on GaAs(100), with and without ammonium hydroxide immersion. FTIR results validate the effectiveness of solution self-assembly using ammonium hydroxide immersion, but indicate incomplete monolayer formation when using reduction of diazonium salts. FTIR further indicates the effectiveness of indirect contacting of GaAs with Au using an Ar backfield. XPS results quantified the amount of sample oxidization at the surface. Furthermore, XPS also verified elemental composition in these samples.
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