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By Shuqing (Victor) Cao1, Yang Liu1, Peter Griffin1
1. Stanford University
This tool simulates dopant diffusion coupled with point defects.
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Version 1.0 - published on 22 Aug 2014
doi:10.4231/D3Q814T06 cite this
This tool is closed source.
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G Klimeck; M. McLennan; M. Lundstrom; George Adams III (2008), "nanoHUB.org - online simulation and more materials for semiconductors and nanoelectronics in education and research," 8th Ieee Conference On Nanotechnology, 2008. Nano : pg. 401-404, IEEE, 08.