Interface Structure/Surface Morphology of (Co,Fe,Ni)/Cu/Si Thin Films

By Brian Demczyk1, R. Naik2, A. Lukaszew, G. W. Auner2, V. M. Naik3

1. None 2. Wayne State university 3. University of Michigan, Dearborn

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The effects of thin film and interfacial stress on the magnetic properties Fe, Co and Ni films deposited by molecular beam epitaxy on Cu underlayers (Si substrate) were examined, employing transmission,ans scanning probe microscopy and reflection high energy diffraction. It ws found that the surface roughness determined scanning probe microscopy correlates with the interface "waviness", deduced by high-resolution electron microscopy, and serves to pull M out of plane.


Transmission electron and scanning probe microscopy was performed at the University of Michigan Electron Microbeam Analysis Laboratory.

Thin film deposition and RHEED conducted at Wayne State University.

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This work was supported by National Science Foundation Grant No. DMR-9321127.

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Researchers should cite this work as follows:

  • Brian Demczyk, R. Naik, A. Lukaszew, G. W. Auner, V. M. Naik (2014), "Interface Structure/Surface Morphology of (Co,Fe,Ni)/Cu/Si Thin Films,"

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