Chemical Vapor Deposition

By Adam Powell

Mechanical Engineering, Worcester Polytechnic Institute, Worcester, MA

Published on

Abstract

Calculate boundary layer sizes and deposition rate profiles along substrates on the bottom of a box-type chemical vapor deposition chamber.

Assignment solution time: 2 hours

Credits

Copyright 2003 Adam C. Powell, IV,
Licensed under MIT Open CourseWare

Cite this work

Researchers should cite this work as follows:

  • Adam Powell (2019), "Chemical Vapor Deposition," https://nanohub.org/resources/30643.

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