On Monday July 6th, the nanoHUB will be intermittently unavailable due to scheduled maintenance. We apologize for any inconvenience this may cause. close


Support Options

Submit a Support Ticket


Illinois ME 498 Introduction of Nano Science and Technology, Lecture 27: Optical Methods

By Nick Fang1, Omar Sobh1

1. University of Illinois at Urbana-Champaign

View Presentation (SWF)

Licensed according to this deed.

Published on


Optical Mathods


  • Photomask and Reticles
  • Positive and Negative Lithography
  • Relationship between Mask and Resist
  • 8 Steps of Photolithography
  • Photolithographic Process
  • Positive Photoresists
  • Negative Photoresists
  • Chemistry of Photo-Crosslinking
  • A simplified Model of Polymerization
  • Photoresist Physical Properties
  • Resist Contrast
  • Photoresist contrast ratio
  • Resist Polarity - Exposure Energy
  • Empirical Resolution
  • Geometric Optics
  • Minimum and Critical Modulation
  • Wavefront Engineering Techniques
  • From Micro to Nano Stereolithography
  • Interference Lithography
  • 3-D Holographic Lithography
  • Near Field Optical Recording
  • Flying Head Plasmonic Nanolithography
  • Cite this work

    Researchers should cite this work as follows:

    • Nick Fang; Omar Sobh (2010), "Illinois ME 498 Introduction of Nano Science and Technology, Lecture 27: Optical Methods ," https://nanohub.org/resources/8171.

      BibTex | EndNote


    nanoHUB.org, a resource for nanoscience and nanotechnology, is supported by the National Science Foundation and other funding agencies. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.