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Illinois ME 498 Introduction of Nano Science and Technology, Lecture 27: Nanomanufacturing 2: Optical Nanomanufacturing

By Nick Fang

University of Illinois at Urbana-Champaign

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Nanomanufacturing 2: Optical Nanomanufacturing


  • Three Basic Exposure Methods
  • Photomask and Reticles
  • Positive and Negative Lithography
  • Relationshil Between Mask and Resist
  • Eight Steps to Photolithography
  • Photolithographic Process
  • Positive Photoresists
  • Negative Photoresists
  • Chemistry of Photo-crosslinking
  • A simplified model of Polymerization
  • PhotoResist Physical Properties
  • Resist Contrast
  • Geometric Optics
  • Fourier Analysis on Image Transfer
  • Modulation Transfer Function
  • The Impact of MTF
  • Wavefront Engineering Techniques
  • From Micro to Nano Stereolithography
  • Plasmon Enhanced Lithography
  • Interference Lithography
  • 3D Holographic Lithography
  • Tags, a resource for nanoscience and nanotechnology, is supported by the National Science Foundation and other funding agencies. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the author(s) and do not necessarily reflect the views of the National Science Foundation.