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Lab Exercise: Atomic Layer Deposition
13 Jan 2017 | | Contributor(s):: NACK Network
The objective of this lab is to evaluate the atomic layer deposition (ALD) process. The ALD process will be used to deposit a transparent conducting oxide (TCO). Principles of resistance and resistivity will also be discussed.
Chemical Equation for TDMAT ALD Formation of TiN?
Closed | Responses: 0
What is the chemical equation for the formation of Titanium Nitride in an ALD system using TDMAT?
[Illinois] AVS Meeting 2012: Understanding Atomic-Layer-Deposition Synthesis of Cu 2 ZnSnS 4 Solar Cells
04 Jun 2013 | | Contributor(s):: Sergey V. Baryshev
Cu2ZnSnS4 (CZTS) has recently attracted attention as a light absorber for photovoltaic applications because of its band gap (εg≈1.4 eV), the relative abundance and low cost of its constituent elements (which permits large-scale low-cost module production), and its demonstrated...
Chemically Enhanced Carbon-Based Nanomaterials and Devices
09 Nov 2010 | | Contributor(s):: Mark Hersam
Carbon-based nanomaterials have attracted significant attention due to their potential to enable and/or improve applications such as transistors, transparent conductors, solar cells, batteries, and biosensors. This talk will delineate chemical strategies for enhancing the electronic and optical...
MSE 376 Lecture 1: Film Deposition Methods
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04 Oct 2006 | | Contributor(s)::
Making the Tiniest and Fastest Transistor using Atomic Layer Deposition (ALD)
13 Feb 2006 | | Contributor(s):: peide ye
Atomic layer deposition (ALD) is an emerging nanotechnology enables the deposit of ultrathin films, one atomic layer by one atomic layer. ALD provides a powerful, new capability to grow or regrow nanoscale ultrathin films of metals, semiconductors and insulators. This presentation introduces ALD...