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2010 Honorary Symposium for Professor Milton Feng at The Micro and Nano Technology Laboratory UIUC
23 Jul 2010 | Series | Contributor(s): Rashid Bashir, Andreas Cangellaris, Omar N Sobh
Symposium honoring Professor Milton Feng on his 60th birthday.
Katie M Smith
MOSFet Demonstration: MOSFET Device Simulation and Analysis
11 Jun 2009 | Animations | Contributor(s): Gerhard Klimeck, Benjamin P Haley
This video shows the simulation and analysis of a MOSFET device using the MOSFet tool. Several powerful analytic features of this tool are demonstrated.
MOSCap Demonstration: MOS Capacitor Simulation
This video shows the simulation of a MOS capacitor using the MOSCAP tool. Several powerful analytic features of this tool are demonstrated.
PN Junction Lab Demonstration: Asymmetric PN Junctions
This video shows the simulation and analysis of a several PN junctions using PN Junction Lab, which is powered by PADRE. Several powerful analytic features of this tool are demonstrated.
Jose M. de la Rosa
CAD of MEMS & NEMS: State of the Art & Future Challenges
5.0 out of 5 stars
04 Mar 2008 | Online Presentations | Contributor(s): Andreas Cangellaris
Computer aided design environments are very mature and used extensively for the design of every integrated electronical component that is commercially available to all of us. This presentation...
Srinivasa Murali Dunga
4.5 out of 5 stars
24 Jul 2007 | Tools | Contributor(s): Steven Clark
Introduction to Schred
0.0 out of 5 stars
28 Jun 2007 | Series | Contributor(s): James K Fodor, Jing Guo
This learning module introduces nanoHUB users to the Schred simulator. A brief introduction to Schred is presented, followed by voiced presentations featuring the simulator in action. Upon...
4.0 out of 5 stars
01 May 2007 | Tools | Contributor(s): J. L. Gray, Michael McLennan
Simulates 1D heterostructures, including solar cells
30 Apr 2007 | Tools | Contributor(s): Steven Clark
TSUPREM-4 is a computer program for simulating the processing steps used in the manufacture of silicon integrated circuits and discrete devices.
Illinois Tools: MOCA
28 Mar 2007 | Tools | Contributor(s): Mohamed Mohamed, Umberto Ravaioli, Nahil Sobh, derrick kearney
A 2D Full-band Monte Carlo (MOCA) Simulation of SOI Device Structures
Abe Yue Huang
09 Feb 2007 | Tools | Contributor(s): Wei Zhao, Yu Cao
Predictive model files for future transistor technologies.
31 Oct 2006 | Tools | Contributor(s): M. E. Klausmeier-Brown, C. M. Maziar, P. E. Dodd, M. A. Stettler, Xufeng Wang, Gerhard Klimeck
Improved program consists of DEMON and SDEMON
Process Lab: Defect-coupled diffusion
3.0 out of 5 stars
31 Oct 2006 | Tools | Contributor(s): Shuqing (Victor) Cao, Yang Liu, Peter Griffin
This tool simulates dopant diffusion coupled with point defects.
Process Lab: Concentration-Dependent Diffusion
This modules simulates both the standard diffusion and concentration-dependent diffusion.