Tags: processing

Resources (41-60 of 126)

  1. ECE 695Q Lecture 38: Nanoimprint Lithography (NIL) – NIL Mold Fabrication

    12 Oct 2016 | | Contributor(s):: Minghao Qi

  2. ECE 695Q Lecture 37: Nanoimprint Lithography (NIL) - Resist for UV-NIL

    12 Oct 2016 | | Contributor(s):: Minghao Qi

  3. ECE 695Q Lecture 29: Focused Electron Beam Induced Deposition and Deposition Rate

    10 Oct 2016 | | Contributor(s):: Minghao Qi

  4. ECE 695Q Lecture 36: Nanoimprint Lithography (NIL) – Alignment in NIL

    28 Sep 2016 | | Contributor(s):: Minghao Qi

  5. ECE 695Q Lecture 39: Nanoimprint Lithography (NIL) – NIL Tools

    26 Sep 2016 | | Contributor(s):: Minghao Qi

  6. ECE 695Q Lecture 40: Nanoimprint Lithography (NIL) – Other NIL Approaches

    26 Sep 2016 | | Contributor(s):: Minghao Qi

  7. ECE 695Q Lecture 32: Nanoimprint Lithography (NIL) – Overview and Thermal NIL Resists

    21 Sep 2016 | | Contributor(s):: Minghao Qi

  8. ECE 695Q Lecture 33: Nanoimprint Lithography – Residual Layer After Nanoimprint

    21 Sep 2016 | | Contributor(s):: Minghao Qi

  9. ECE 695Q Lecture 34: Nanoimprint Lithography – Pattern Dependence in Nanoimprint

    21 Sep 2016 | | Contributor(s):: Minghao Qi

  10. ECE 695Q Lecture 35: Nanoimprint Lithography – UV Assisted Nanoimprint

    21 Sep 2016 | | Contributor(s):: Minghao Qi

  11. ECE 695Q Lecture 21: E-Beam Lithography Process

    20 Sep 2016 | | Contributor(s):: Minghao Qi

  12. ECE 695Q: Nanometer Scale Patterning and Processing

    11 Jul 2016 | | Contributor(s):: Minghao Qi

    This course is a top-down approach to the fabrication of nanometer-scale (<100nm) structures. Principles of lithography, film deposition, reactive-ion etch and planarization are presented. The couse provides a survey of state-of-the-art nanofabrication techniques.

  13. ECE 695Q Lecture 16: Electron Optics and Lithography I

    29 Jun 2016 | | Contributor(s):: Minghao Qi

  14. ECE 695Q Lecture 10: Optical Lithography – Resolution Enhancement Techniques

    17 Jun 2016 | | Contributor(s):: Minghao Qi

  15. ECE 695Q Lecture 15: Extreme UV (EUV) Lithography – Optics, Mask, Resist, and Contaminaton Control

    17 Jun 2016 | | Contributor(s):: Minghao Qi

  16. ECE 695Q Lecture 17: Electron Optics and Lithography II

    16 Jun 2016 | | Contributor(s):: Minghao Qi

  17. ECE 695Q Lecture 14: Extreme UV (EUV) Lithography – EUV Source (Hot and Dense Plasma)

    16 Jun 2016 | | Contributor(s):: Minghao Qi

  18. ECE 695Q Lecture 18: Electron Beam Lithography I

    14 Jun 2016 | | Contributor(s):: Minghao Qi

  19. ECE 695Q Lecture 13: Extreme UV (EUV) Lithography – Overview, Why EUV Lithography?

    14 Jun 2016 | | Contributor(s):: Minghao Qi

  20. ECE 695Q Lecture 12: Optical Lithography – Contrast and Resolution in Microscopy and Lithography Systems

    06 Jun 2016 | | Contributor(s):: Minghao Qi