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a TCAD Lab
29 Oct 2008 | | Contributor(s):: Gerhard Klimeck, Dragica Vasileska
An Assembly of TCAD tools for circuit, device, and process simulation
Process Lab: Concentration-Dependent Diffusion
09 Oct 2006 | | Contributor(s):: Shuqing (Victor) Cao, yang liu, Peter Griffin
This modules simulates both the standard diffusion and concentration-dependent diffusion.
Process Lab: Defect-coupled diffusion
This tool simulates dopant diffusion coupled with point defects.
Process Lab: Oxidation Flux
This module simulates the oxidation flux.
Integrated Circuit Fabrication Process Simulation
15 May 2005 | | Contributor(s):: Connor S. Rafferty, kent smith, Yang Liu, Derrick Kearney, Steven Clark
Framework for solving systems of partial differential equations (PDEs) in time and 1, 2, or 3 space dimensions
30 Apr 2007 | | Contributor(s):: Steven Clark
TSUPREM-4 is a computer program for simulating the processing steps used in the manufacture of silicon integrated circuits and discrete devices.