Tags: processing

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  1. ME 290R Lecture 4.2: Nanoimprint Lithography – Imprintable Materials II

    15 Apr 2019 |

  2. ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  3. ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  4. ME 290R Lecture 6.2: Nanoimprint Lithography – Machine Design II

    15 Apr 2019 | | Contributor(s):: Taylor, Hayden

  5. ME 290R Lecture 4.1: Nanoimprint Lithography – Imprintable Materials I

    05 Apr 2019 | | Contributor(s):: Taylor, Hayden

  6. ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  7. ME 290R Lecture 3.2: Nanoimprint Lithography - Process Mechanics II

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  8. ME 290R Lecture 3.3: Nanoimprint Lithography - Process Mechanics III

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  9. ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV

    02 Apr 2019 | | Contributor(s):: Taylor, Hayden

  10. ME 290R Lecture 1: Introduction

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.

  11. ME 290R Lecture 2.1: Lithography Performance Criteria - Technical

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

  12. ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)

    27 Mar 2019 | | Contributor(s):: Taylor, Hayden

    Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

  13. Learning Module: MEMS Micromachining Overview

    22 Jun 2017 | | Contributor(s):: Southwest Center for Microsystems Education (SCME)

    This learning module provides an overview of three micromachining processes (bulk, surface, LIGA) used for the fabrication of microsystems or MEMS (MicroElectroMechanical Systems).  Activities are provided that contribution to a better understanding of these processes and that encourage...

  14. Learning Module: MEMS Micromachining Overview - Instructor Guides

    22 Jun 2017 | | Contributor(s):: Southwest Center for Microsystems Education (SCME)

    This learning module provides an overview of three micromachining processes (bulk, surface, LIGA) used for the fabrication of microsystems or MEMS (MicroElectroMechanical Systems).  Activities are provided that contribution to a better understanding of these processes and that encourage...

  15. Learning Module: Photolithography Overview for MEMS

    26 Apr 2017 | | Contributor(s):: Southwest Center for Microsystems Education (SCME)

    This learning module provides an overview of the most common photolithography process used for the fabrication of microelectromechanical systems (MEMS), its terminology and basic concepts.  Activities allow you to further explore some of these concepts.

  16. ECE 695Q Lecture 42: Advanced Lithography II

    02 Dec 2016 | | Contributor(s):: Minghao Qi

  17. ECE 695Q Lecture 45: Dry Etching I

    02 Dec 2016 | | Contributor(s):: Minghao Qi

  18. ECE 695Q Lecture 44: Etching

    02 Dec 2016 | | Contributor(s):: Minghao Qi

  19. ECE 695Q Lecture 46: Dry Etching II

    01 Dec 2016 | | Contributor(s):: Minghao Qi

  20. ECE 695Q Lecture 47: Dry Etching III

    01 Dec 2016 | | Contributor(s):: Minghao Qi