Illinois Tools: Nanofilm Lab

By Nahil Sobh1, Zuhaib Bashir Sheikh1

1. University of Illinois at Urbana-Champaign

Interaction of electromagnetic plane wave and nanoscale metallic film with subwavelength slit

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Version 1.2b - published on 31 Mar 2016

doi:10.4231/D3M32NB58 cite this

Open source: license | download

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Usage

World usage

Location of all "Illinois Tools: Nanofilm Lab" Users Since Its Posting

Simulation Users

104

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Users By Organization Type
Type Users
Educational - University 74 (71.15%)
Unidentified 26 (25%)
Educational - Pre-College 2 (1.92%)
Unemployed 1 (0.96%)
National Lab 1 (0.96%)
Users by Country of Residence
Country Users
us UNITED STATES 30 (48.39%)
in INDIA 10 (16.13%)
cn CHINA 6 (9.68%)
tr TURKEY 3 (4.84%)
de GERMANY 3 (4.84%)
ir IRAN, ISLAMIC REPUBLIC OF 2 (3.23%)
kr KOREA, REPUBLIC OF 2 (3.23%)
dz ALGERIA 2 (3.23%)
ro ROMANIA 2 (3.23%)
ca CANADA 2 (3.23%)

Simulation Runs

349

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Overview
Average Total
Wall Clock Time 2.91 hours 20.86 days
CPU time 3.65 minutes 10.46 hours
Interaction Time 1.98 hours 14.16 days