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Illinois Tools: Nanofilm Lab

By Nahil Sobh1, Zuhaib Bashir Sheikh1

1. University of Illinois at Urbana-Champaign

Interaction of electromagnetic plane wave and nanoscale metallic film with subwavelength slit

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Version 1.2 - published on 24 May 2011

doi:10.4231/D36T0GW2P cite this

Open source: license | download

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Usage

World usage

Location of all "Illinois Tools: Nanofilm Lab" Users Since Its Posting

Simulation Users

69

14 17 19 19 22 22 26 27 30 32 32 36 38 39 39 40 41 41 43 44 45 45 48 51 54 56 57 60 60 61 62 62 65 67 69 69

Users By Organization Type
Type Users
Educational - University 50 (72.46%)
Unidentified 15 (21.74%)
Educational - Pre-College 2 (2.9%)
National Lab 1 (1.45%)
Unemployed 1 (1.45%)
Users by Country of Residence
Country Users
us UNITED STATES 25 (55.56%)
in INDIA 4 (8.89%)
cn CHINA 4 (8.89%)
it ITALY 2 (4.44%)
ca CANADA 2 (4.44%)
ro ROMANIA 2 (4.44%)
kr KOREA, REPUBLIC OF 2 (4.44%)
dz ALGERIA 2 (4.44%)
tn TUNISIA 1 (2.22%)
ie IRELAND 1 (2.22%)

Simulation Runs

281

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Overview
Average Total
Wall Clock Time 3.08 hours 19.74 days
CPU time 1.03 minutes 2.64 hours
Interaction Time 2.25 hours 14.43 days

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