Tags: chemical vapor deposition (CVD)

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Description

Chemical vapor deposition is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.

For more information see Wikipedia

Members (1-14 of 14)

  1. Ian Harreschou

    https://nanohub.org/members/377348

  2. Lain-Jong (Lance) Li

    Dr. Lain-Jong Li received a BSc and an MSc in chemistry at the National Taiwan University. After 5 years of R&D at the Taiwan Semiconductor Manufacturing Company (1997-2002), he obtained his PhD in...

    https://nanohub.org/members/324936

  3. Kaustubh Bawdekar

    https://nanohub.org/members/220210

  4. Arpit Jaiswal

    I am a grad student at University at Buffalo. I did my undergrad studies from RTMNU India. I am currently working on Graphene plasmonics.

    https://nanohub.org/members/208950

  5. Matthew Glen Robertson

    https://nanohub.org/members/149764

  6. Sandip Mazumder

    Sandip Mazumder received his Ph.D. in Mechanical Engineering from Penn State University. After graduation, he joined CFD Research Corporation, where he was one of the architects and early...

    https://nanohub.org/members/137944

  7. Javier Merón Pino

    https://nanohub.org/members/131817

  8. poonam sharma

    https://nanohub.org/members/126939

  9. Carolina Marques

    https://nanohub.org/members/113848

  10. Satender Kataria

    https://nanohub.org/members/71722

  11. ramakrishna madaka

    https://nanohub.org/members/67721

  12. ROSHAN CHANDRA

    https://nanohub.org/members/60560

  13. Takuya Noguchi

    https://nanohub.org/members/39457

  14. Zhi Tang

    Zhi Tang is currently a research scientist in Beijing Kingway Technology, a high-tech startup founded at Beijing in 2010. He graduated from MechSE department in UIUC with his PhD degree in 2008. He...

    https://nanohub.org/members/1966