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Chemical vapor deposition is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.
For more information see Wikipedia
Chemical Vapor Deposition Reactor Design
Teaching Materials | 28 May 2019 | Contributor(s):: Adam Powell
Sketch the streamlines in a tube CVD reactor and propose a design change which would lead to more uniform deposition.
Chemical Vapor Deposition
Calculate boundary layer sizes and deposition rate profiles along substrates on the bottom of a box-type chemical vapor deposition chamber.
Learning Module: Deposition Processes Overview for Microsystems - Instructor Guides
Teaching Materials | 26 Apr 2017 | Contributor(s):: Southwest Center for Microsystems Education (SCME)
This learning module is an introduction to the common processes used to deposit thin films for the fabrication of micro-size devices. Thermal oxidation and several types of deposition are discussed. Activities provide further exploration into these processes as well as the properties...
Learning Module: Deposition Processes Overview for Microsystems
Teaching Materials | 28 Apr 2016 | Contributor(s):: Support Center for Microsystems Education (SCME), MJ Willis
This learning module is an overview of the common deposition processes used for the fabrication of micro-size devices. This learning module discusses thermal oxidation, chemical deposition and physical deposition processes. Activities are provided for further exploration into these...