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Chemical vapor deposition is a vacuum deposition method used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films.
For more information see Wikipedia
1D Moving Fin Model
19 Jul 2016 | | Contributor(s):: Yudong Chen, Majed Abdullah Alrefae, Timothy S Fisher
Simulate 1-D moving fin model for CVD roll-to-roll plasma system
Gr-ResQ
05 Nov 2018 | | Contributor(s):: Joshua A Schiller, Kaihao Zhang, Kevin James Cruse, Darren K Adams, Elif Ertekin, Sameh H Tawfick, Mitisha Surana, Aagam Rajeev Shah, Ricardo Toro
Query submit and analyse graphene sythesis data.