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Comparison of strain relaxation in epitaxial Si0.3Ge0.7 films grown on Si(001) and Ge(001)
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Comparison of strain relaxation in epitaxial Si0.3Ge0.7 films grown on Si(001) and Ge(001)
By
Brian Demczyk
1
; R. Naik; G. Auner; C. Kota; U. Rao
1. None
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