Online Presentations (21-40 of 74)

1. ME 290R Lecture 7.1: Nanoimprint Lithography – Applications I

   Online Presentations | 07 May 2019 | Contributor(s):: Taylor, Hayden

2. ME 290R Lecture 4.2: Nanoimprint Lithography – Imprintable Materials II

   Online Presentations | 15 Apr 2019 | Contributor(s):: Taylor, Hayden

3. ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication

   Online Presentations | 15 Apr 2019 | Contributor(s):: Taylor, Hayden

4. ME 290R Lecture 6.1: Nanoimprint Lithography - Machine Design I

   Online Presentations | 15 Apr 2019 | Contributor(s):: Taylor, Hayden

5. ME 290R Lecture 6.2: Nanoimprint Lithography – Machine Design II

   Online Presentations | 15 Apr 2019 | Contributor(s):: Taylor, Hayden

6. ME 290R Lecture 4.1: Nanoimprint Lithography – Imprintable Materials I

   Online Presentations | 05 Apr 2019 | Contributor(s):: Taylor, Hayden

7. ME 290R Lecture 3.1: Nanoimprint Lithography - Process Mechanics I

   Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden

8. ME 290R Lecture 3.2: Nanoimprint Lithography - Process Mechanics II

   Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden

9. ME 290R Lecture 3.3: Nanoimprint Lithography - Process Mechanics III

   Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden

10. ME 290R Lecture 3.4: Nanoimprint Lithography - Process Mechanics IV

    Online Presentations | 02 Apr 2019 | Contributor(s):: Taylor, Hayden

11. ME 290R Lecture 1: Introduction

    Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden

    An overview of current and emerging lithography technologies and challenges. Future lithography requirements (with reference to the International Technology Roadmap for Semiconductors). Requirements for integration of lithography with other process steps.

12. ME 290R Lecture 2.1: Lithography Performance Criteria - Technical

    Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden

    Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

13. ME 290R Lecture 2.2: Lithography Performance Criteria - Technical (Yield Modeling)

    Online Presentations | 27 Mar 2019 | Contributor(s):: Taylor, Hayden

    Ways to evaluate a lithography process. Topics include: resolution; line edge roughness; overlay capability; throughput; cost of ownership; capital cost; energy consumption and environmental impact (e.g. solvent usage; material wastage); pattern dependencies.

14. Tutorial on Two Photon Lithography Tool

    Online Presentations | 26 Nov 2018 | Contributor(s):: Mohammad Mahfuzul Kabir, Varun Ajit Kelkar

    Two-photon lithography (TPL) is a nano-scale 3-d fabrication technique. TPL depends upon the two-photon polymerization process, whereby two incident photons of light are absorbed by a precursor material leading to polymerization. The smallest feature size (voxel) achievable in a TPL...

15. ECE 695Q Lecture 42: Advanced Lithography II

    Online Presentations | 02 Dec 2016 | Contributor(s):: Minghao Qi

16. ECE 695Q Lecture 43: Advanced Lithography III

    Online Presentations | 01 Nov 2016 | Contributor(s):: Minghao Qi

17. ECE 695Q Lecture 41: Advanced Lithography I

    Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi

18. ECE 695Q Lecture 38: Nanoimprint Lithography (NIL) – NIL Mold Fabrication

    Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi

19. ECE 695Q Lecture 37: Nanoimprint Lithography (NIL) - Resist for UV-NIL

    Online Presentations | 12 Oct 2016 | Contributor(s):: Minghao Qi

20. ECE 695Q Lecture 36: Nanoimprint Lithography (NIL) – Alignment in NIL

    Online Presentations | 28 Sep 2016 | Contributor(s):: Minghao Qi