Process Optimization of Graphene Growth

Optimizes the growth of graphene in a plasma chemical vapor deposition (CVD) system.

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Version 1.0 - published on 31 Jul 2017

doi:10.4231/D30P0WS8Z cite this

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Usage

World usage

Location of all "Process Optimization of Graphene Growth" Users Since Its Posting

Cumulative Simulation Users

79

4 12 14 16 18 27 31 34 35 38 39 41 43 45 47 49 50 51 54 57 57 60 60 60 60 62 64 65 65 66 69 73 75 78 78 79 79

Users By Organization Type
Type Users
Unidentified 58 (73.42%)
Educational - University 20 (25.32%)
National Lab 1 (1.27%)
Users by Country of Residence
Country Users
us UNITED STATES 9 (47.37%)
in INDIA 4 (21.05%)
ru RUSSIAN FEDERATION 2 (10.53%)
ch SWITZERLAND 1 (5.26%)
dz ALGERIA 1 (5.26%)
de GERMANY 1 (5.26%)
gr GREECE 1 (5.26%)

Simulation Runs

295

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Overview
Average Total
Wall Clock Time 3.59 hours 25.29 days
CPU time 6.39 seconds 18.01 minutes
Interaction Time 28.33 minutes 3.32 days