Process Optimization of Graphene Growth

Optimizes the growth of graphene in a plasma chemical vapor deposition (CVD) system.

Launch Tool

You must login before you can run this tool.

Version 1.0 - published on 31 Jul 2017

doi:10.4231/D30P0WS8Z cite this

This tool is closed source.

View All Supporting Documents

Usage

World usage

Location of all "Process Optimization of Graphene Growth" Users Since Its Posting

Cumulative Simulation Users

110

4 12 14 16 18 27 31 34 35 38 39 41 43 45 47 49 50 51 54 57 57 60 60 60 60 62 64 65 65 66 69 73 75 78 78 79 80 82 84 84 85 86 88 89 90 90 93 93 94 94 95 95 97 97 98 101 101 101 102 104 104 106 108 108 110 110 110 110

Simulation Runs

420

10 42 46 61 66 86 102 116 118 127 140 144 158 168 172 176 182 184 190 196 196 202 202 202 202 206 210 214 214 224 234 248 254 275 275 295 297 303 307 315 319 321 325 333 339 339 347 347 354 356 358 358 365 365 366 376 376 376 382 388 388 396 406 408 418 420 420 420
Overview
Average Total
Wall Clock Time 2.83 hours 27.57 days
CPU time 7.08 seconds 27.62 minutes
Interaction Time 22.14 minutes 3.6 days