Process Optimization of Graphene Growth

Optimizes the growth of graphene in a plasma chemical vapor deposition (CVD) system.

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Version 1.0 - published on 31 Jul 2017

doi:10.4231/D30P0WS8Z cite this

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World usage

Location of all "Process Optimization of Graphene Growth" Users Since Its Posting

Simulation Users

31

4 12 14 16 18 27 31 31

Users By Organization Type
Type Users
Unidentified 19 (61.29%)
Educational - University 12 (38.71%)
Users by Country of Residence
Country Users
us UNITED STATES 6 (54.55%)
dz ALGERIA 1 (9.09%)
ru RUSSIAN FEDERATION 1 (9.09%)
de GERMANY 1 (9.09%)
in INDIA 1 (9.09%)
ch SWITZERLAND 1 (9.09%)

Simulation Runs

104

10 42 46 61 66 86 102 104
Overview
Average Total
Wall Clock Time 1.26 hours 3.09 days
CPU time 1.08 seconds 1.06 minutes
Interaction Time 42.46 minutes 1.74 days