Process Optimization of Graphene Growth

Optimizes the growth of graphene in a plasma chemical vapor deposition (CVD) system.

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Version 1.0 - published on 31 Jul 2017

doi:10.4231/D30P0WS8Z cite this

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Usage

World usage

Location of all "Process Optimization of Graphene Growth" Users Since Its Posting

Cumulative Simulation Users

93

4 12 14 16 18 27 31 34 35 38 39 41 43 45 47 49 50 51 54 57 57 60 60 60 60 62 64 65 65 66 69 73 75 78 78 79 80 82 84 84 85 86 88 89 90 90 93 93

Users By Organization Type
Type Users
Unidentified 71 (76.34%)
Educational - University 21 (22.58%)
National Lab 1 (1.08%)
Users by Country of Residence
Country Users
us UNITED STATES 9 (45%)
in INDIA 4 (20%)
ru RUSSIAN FEDERATION 2 (10%)
au AUSTRALIA 1 (5%)
de GERMANY 1 (5%)
gr GREECE 1 (5%)
ch SWITZERLAND 1 (5%)
dz ALGERIA 1 (5%)

Simulation Runs

347

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Overview
Average Total
Wall Clock Time 3.32 hours 26.99 days
CPU time 6.84 seconds 22.21 minutes
Interaction Time 24.88 minutes 3.37 days