Interface Structure/Surface Morphology of (Co,Fe,Ni)/Cu/Si Thin Films

By Brian Demczyk1; R. Naik2; A. Lukaszew; G. W. Auner2; V. M. Naik3

1. None 2. Wayne State university 3. University of Michigan, Dearborn

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Abstract

The effects of thin film and interfacial stress on the magnetic properties Fe, Co and Ni films deposited by molecular beam epitaxy on Cu underlayers (Si substrate) were examined, employing transmission,ans scanning probe microscopy and reflection high energy diffraction. It ws found that the surface roughness determined scanning probe microscopy correlates with the interface "waviness", deduced by high-resolution electron microscopy, and serves to pull M out of plane.

Credits

Transmission electron and scanning probe microscopy was performed at the University of Michigan Electron Microbeam Analysis Laboratory.

Thin film deposition and RHEED conducted at Wayne State University.

Sponsored by

This work was supported by National Science Foundation Grant No. DMR-9321127.

Cite this work

Researchers should cite this work as follows:

  • Brian Demczyk, R. Naik, A. Lukaszew, G. W. Auner, V. M. Naik (2014), "Interface Structure/Surface Morphology of (Co,Fe,Ni)/Cu/Si Thin Films," https://nanohub.org/resources/20737.

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Tags

  1. atomic force microscopy (AFM)
  2. cobalt
  3. high resolution electron microscopy
  4. interface roughness
  5. iron
  6. magnetic anisotropy
  7. magnetic domains
  8. magnetic force microscopy
  9. magnetic thin films
  10. mbe
  11. nickel
  12. Reflection High Energy Electron Diffraction
  13. surface roughness
  14. thin film stress