Nano-Characterization and Nano-Fabrication using EB/IB Tools

By Tomoko Borsa1; NACK Network2

1. Colorado Shared Instrumentation in Nanofabrication and Characterization (COSINC), University of Colorado, Boulder, CO 2. Nanotechnology Applications and Career Knowledge Network, Pennsylvania State University, State College, PA

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Bio

Tomoko Borsa Tomoko Borsa was born in Tokyo, Japan and completed a BS and MS at Waseda University, where she was exposed to the field of scanning electron microscopy for the first time. She then earned a Ph.D. in Materials Science with an emphasis on Chemistry of Materials from Colorado School of Mines. She also received an MS in Electrical Engineering (Photonics and Nanostructures) from University of Colorado Boulder. She also has extensive experience in the area of micro/nanofabrication including electron beam lithography and related process development.

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Center for Nanotechnology Education and Utilization (CNEU)

Cite this work

Researchers should cite this work as follows:

  • Tomoko Borsa, NACK Network (2022), "Nano-Characterization and Nano-Fabrication using EB/IB Tools," https://nanohub.org/resources/36343.

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Tags

  1. characterization
  2. electron beam
  3. fabrication
  4. Ion Beam
  5. lithography
  6. materials science
  7. NACK Network
Nano-Characterization and Nano-Fabrication using EB/IB Tools
  • Nano-Characterization and Nano-Fabrication using EB/IB tools 1. Nano-Characterization and Nano… 0
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  • Table of Contents 2. Table of Contents 86.086086086086084
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  • Introduction to 3. Introduction to "Nano-World" 154.45445445445446
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  • Nano/Micro/Macro World 4. Nano/Micro/Macro World 220.58725392058727
    00:00/00:00
  • Brief History of Characterization with Microscopes 5. Brief History of Characterizat… 382.48248248248251
    00:00/00:00
  • Nano-Characterization 6. Nano-Characterization 707.90790790790788
    00:00/00:00
  • Nano-Fabrication 7. Nano-Fabrication 745.64564564564569
    00:00/00:00
  • Semiconductor History 8. Semiconductor History 943.51017684351018
    00:00/00:00
  • MOSFET Scaling 9. MOSFET Scaling 1040.4738071404738
    00:00/00:00
  • Optical Lithography 10. Optical Lithography 1175.3753753753754
    00:00/00:00
  • Optical Lithography 11. Optical Lithography 1284.4177510844179
    00:00/00:00
  • DUV and EUV Lithography 12. DUV and EUV Lithography 1365.1317984651319
    00:00/00:00
  • Photon-Based Lithography 13. Photon-Based Lithography 1504.1041041041042
    00:00/00:00
  • Photon-Based Lithography 14. Photon-Based Lithography 1530.4304304304305
    00:00/00:00
  • Lithography for Nano-Fabrication 15. Lithography for Nano-Fabricati… 1596.2295628962297
    00:00/00:00
  • Lithography for Nano-Fabrication 16. Lithography for Nano-Fabricati… 1663.1631631631633
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  • Electron Beam Lithography 17. Electron Beam Lithography 1685.9526192859528
    00:00/00:00
  • Inside an IBM Quantum Chip 18. Inside an IBM Quantum Chip 1780.6806806806808
    00:00/00:00
  • Photons and Electrons 19. Photons and Electrons 1841.207874541208
    00:00/00:00
  • Electron Beam Lithography 20. Electron Beam Lithography 1975.0750750750751
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  • EBL Process 21. EBL Process 2083.5835835835837
    00:00/00:00
  • EBL Post Processing (Pattern Transfer) 22. EBL Post Processing (Pattern T… 2228.2282282282281
    00:00/00:00
  • COP/PMMA DL Lift-Off Process 23. COP/PMMA DL Lift-Off Process 2312.0453787120455
    00:00/00:00
  • Resolution Pattern 24. Resolution Pattern 2350.0500500500502
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  • Resolution Test Results 25. Resolution Test Results 2394.3943943943946
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  • Resolution Test Results: Lift-Off 26. Resolution Test Results: Lift-… 2474.3410076743412
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  • EBL Post Processing (Pattern Transfer) 27. EBL Post Processing (Pattern T… 2592.5258591925258
    00:00/00:00
  • Zep REI Etch Process 28. Zep REI Etch Process 2644.9115782449117
    00:00/00:00
  • Resolution Test Results: RIE Etch 29. Resolution Test Results: RIE E… 2649.9165832499166
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  • EBL in Research Environment 30. EBL in Research Environment 2664.0974307640977
    00:00/00:00
  • EBL in Research Environment 31. EBL in Research Environment 2734.6346346346349
    00:00/00:00
  • Nano-Fabrication in Research Environment 32. Nano-Fabrication in Research E… 2761.3947280613947
    00:00/00:00
  • Lithography for Nano-Fabrication 33. Lithography for Nano-Fabricati… 2818.6186186186187
    00:00/00:00
  • FIB/SEM 34. FIB/SEM 2837.2372372372374
    00:00/00:00
  • Electrons and Ga+ Ions 35. Electrons and Ga+ Ions 2903.5035035035035
    00:00/00:00
  • In-Solid Interaction 36. In-Solid Interaction 2952.7193860527195
    00:00/00:00
  • What can IB Do? 37. What can IB Do? 3069.2025358692026
    00:00/00:00
  • Examples: Fabrication of Plasmonic Antennas 38. Examples: Fabrication of Plasm… 3189.155822489156
    00:00/00:00
  • EBL and IBL 39. EBL and IBL 3238.4050717384052
    00:00/00:00
  • EBL and IBL 40. EBL and IBL 3268.2015348682016
    00:00/00:00
  • Example 1: AFM Probe Modification 41. Example 1: AFM Probe Modificat… 3455.4888221554888
    00:00/00:00
  • Example 2: Metal Tip Modification 42. Example 2: Metal Tip Modificat… 3606.2395729062396
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  • Example 3: Cutting out a Slab with a Specific Crystallographic Orientation 43. Example 3: Cutting out a Slab … 3669.4027360694031
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  • FIB (FIB-FESEM) 44. FIB (FIB-FESEM) 3747.6142809476146
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  • FIB as Characterization Tool 45. FIB as Characterization Tool 3807.640974307641
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  • Demo 46. Demo 3935.5021688355023
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