John Weaver serves as the Facility Manager for the BirckNanotechnology Center at Purdue University. He is responsible forthe facility infrastructure, safety and training activities, andcleanroom and laboratory operations. John received his BS degree inChemistry at Adrian College in 1972, and joined RCA Solid StateDivision in process engineering in the world’s first production CMOSfabrication facility. In 1975 he moved to Hughes Aircraft Company’sSolid State Products Division in Newport Beach, California, where hecontinued his role in high-volume manufacturing-support engineering.In 1977, he moved to what is now Delphi Corporation in Kokomo,Indiana. During his career, John has been involved in a variety ofroles in semiconductor process support, process development, andprocessing facilities development. John has published numerouspapers in both the process development and contamination controlfields, has two patents in process development, and authored a bookand a book chapter in contamination control technology. He hastaught a wide variety of industry short-courses, and is the recipientof the Willis J. Whitfield Award for contributions to the field ofcontamination control. He is a Senior Member of the Institute forEnvironmental Sciences and Technology, President of the IndianaChapter, member of the Editorial Board for the Journal of the IEST,and is a Principal Member of the NFPA 318 committee, which writesfire standards for cleanrooms. He has been involved in the design,construction, and/or operation of more than 25 cleanrooms and cleanfacilities during his career.
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