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ECE 659 Lecture 4: Landauer Model
27 Jan 2009 | | Contributor(s):: Supriyo Datta
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ECE 659 Lecture 1: Introduction
21 Jan 2009 | | Contributor(s):: Supriyo Datta
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ECE 659 Lecture 2: Molecular, Ballistic and Diffusive Transport
21 Jan 2009 | | Contributor(s):: Supriyo Datta
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ECE 659 Lecture 3: Mobility
21 Jan 2009 | | Contributor(s):: Supriyo Datta
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ECE 612 Lecture 27: Heterojunction Bipolar Transistors
15 Dec 2008 | | Contributor(s):: Mark Lundstrom
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ECE 612 Lecture 26: Heterostructure FETs
10 Dec 2008 | | Contributor(s):: Mark Lundstrom
Outline:1) Introduction,2) Heterojunction review,3) Modulation doping,4) I-V characteristics,5) Device Structure / Materials,6) Summary.
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ECE 612 Lecture 25: SOI Electrostatics
08 Dec 2008 | | Contributor(s):: Mark Lundstrom
Outline:1. Introduction,2. General solution, 3. VTF vs. VGB,4. Subthreshold slope,5. Double gate (DG) SOI,6. Recap,7. Discussion,8. Summary.
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ECE 612 Lecture 22: CMOS Circuit Essentials
24 Nov 2008 | | Contributor(s):: Mark Lundstrom
Outline: 1) The CMOS inverter,2) Speed,3) Power,4) Circuit performance,5) Metrics,6) Limits.This lecture is an overview of CMOS circuits. For a more detailed presentation, the following lectures from the Fall 2006 teaching of this course should be viewed:Lecture 24: CMOS Circuits, Part I (Fall...
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ECE 606 Lecture 32: MOS Electrostatics I
19 Nov 2008 | | Contributor(s):: Muhammad A. Alam
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ECE 606 Lecture 26: Schottky Diode II
19 Nov 2008 | | Contributor(s):: Muhammad A. Alam
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ECE 612 Lecture 18B: CMOS Process Flow
18 Nov 2008 | | Contributor(s):: Mark Lundstrom
For a basic, CMOS process flow for an STI (shallow trench isolation process), see: http://www.rit.edu/~lffeee/AdvCmos2003.pdf.This lecture is a condensed version of the more complete presentation (listed above) by Dr. Fuller.
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ECE 612 Lecture 20: Broad Overview of Reliability of Semiconductor MOSFET
14 Nov 2008 | | Contributor(s):: Muhammad A. Alam
Guest lecturer: Muhammad A. Alam.
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ECE 612 Lecture 19: Device Variability
14 Nov 2008 | | Contributor(s):: Mark Lundstrom
Outline:1) Sources of variability,2) Random dopantfluctuations (RDF),3) Line edge roughness (LER),4) Impact on design.
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ECE 612 Lecture 18A: CMOS Process Steps
12 Nov 2008 | | Contributor(s):: Mark Lundstrom
Outline: 1) Unit Process Operations,2) Process Variations.
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ECE 606: Principles of Semiconductor Devices
12 Nov 2008 | | Contributor(s):: Muhammad A. Alam
In the last 50 years, solid state devices like transistors have evolved from an interesting laboratory experiment to a technology with applications in all aspects of modern life. Making transistors is a complex process that requires unprecedented collaboration among material scientists, solid...
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Lecture 2: Thresholds, Islands, and Fractals
04 Nov 2008 | | Contributor(s):: Muhammad A. Alam
Three basic concepts of the percolation theory – namely, percolation threshold, cluster size distribution, and fractal dimension – are defined and methods to calculate them are illustrated via elementary examples. These three concepts will form the theoretical foundation for discussion in Lecture...
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Lecture 1: Percolation in Electronic Devices
04 Nov 2008 | | Contributor(s):: Muhammad A. Alam
Even a casual review of modern electronics quickly convinces everyone that randomness of geometrical parameters must play a key role in understanding the transport properties. Despite the diversity of these phenomena however, the concepts percolation theory provides a broad theoretical framework...
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ECE 612 Lecture 17: Gate Resistance and Interconnects
03 Nov 2008 | | Contributor(s):: Mark Lundstrom
Outline:1) Gate Resistance,2) Interconnects,3) ITRS,4) Summary.
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Percolation Theory
03 Nov 2008 | | Contributor(s):: Muhammad A. Alam
The electronic devices these days have become so small that the number of dopant atoms in the channel of a MOFET transistor, the number of oxide atoms in its gate dielectric, the number silicon- or metal crystals in nanocrystal Flash memory, the number of Nanowires in a flexible nanoNET...
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ECE 612 Lecture 16: MOSFET Leakage
31 Oct 2008 | | Contributor(s):: Mark Lundstrom
Outline:1) MOSFET leakage components,2) Band to band tunneling,3) Gate-induced drain leakage,4) Gate leakage,5) Scaling and ITRS,6) Summary.