Unit Operations of Nanomanufacturing

By Roger T. Bonnecaze

Chemical Engineering, The University of Texas at Austin, Austin, TX

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Abstract

Flexible, scalable and cost-effective manufacturing of nano-enabled devices will require modular processes or unit operations that can be arranged in specific process flows for different devices.    The utility of this approach is illustrated by its success in chemical manufacturing where a virtually limitless number of chemical products are made at any scale. Chemical plants are composed of unit operations, such as pumps, pipes, reactors and separators. These chemical unit operations are well-understood and simulation tools are available to design and explore production strategies in silico to mitigate risk and lower cost before construction of a production facility.

It is the dawning of the era of manufacturing of nano-enabled devices on rigid and flexible substrates with varying form factors. Like chemical plants, these nanomanufacturing facilities will be composed of unit operations that will involve 3D patterning and nanosculpting, direct nanoscale deposition of functional materials, nanometer and atomically thin film transfer, and directed self-assembly of nanoparticles and structured polymers, among other processes. We present an initial list of these unit operations and discuss the needs and opportunities for modeling and simulating them. We also present detailed results for unit operations and simulation tools for: 1) imprint lithography; 2) directed self-assembly of spherical and rectangular particles for bit patterned-media; 3) nanosculpting of multi-tiered patterns for spin-transfer torque RAM. These three examples illustrate the power of the unit operation concept coupled with simulation for the development and evaluation of nanomanufacturing systems.

Bio

Dr. Roger T. Bonnecaze is the William and Bettye Nowlin Chair of Engineering in the McKetta Department of Chemical Engineering and the co- Director of the NSF Engineering Research Center for Nanomanufacturing Systems for Mobile Computing and Energy Technologies (NASCENT) at The University of Texas at Austin.    He received his B.S. (‘85) from Cornell University and his M.S. (‘87) and Ph.D. (‘91) from the California Institute of Technology, all in chemical engineering. Between his M.S. and Ph.D., Dr. Bonnecaze was a project manager for Hydro Research Science working on environmental fluid mechanics and hydraulics issues. After his doctorate, Dr. Bonnecaze was a BP Post-Doctoral Fellow at the Department of Applied Mathematics and Theoretical Physics. He joined the faculty at The University of Texas in 1993. Dr. Bonnecaze’s research interests include nanomanufacturing modeling and simulation and the rheology of complex fluids. He has won the NSF Young Investigator Award, David and Lucile Packard Foundation Fellowship, the AIChE Thomas Baron Award and numerous teaching awards. Dr. Bonnecaze is a Fellow of the American Physical Society, the American Institute of Chemical Engineers and the American Associate for the Advancement of Science.

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Cite this work

Researchers should cite this work as follows:

  • Roger T. Bonnecaze (2015), "Unit Operations of Nanomanufacturing," https://nanohub.org/resources/21958.

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Birck Technology Center, Room 1001, Purdue University, West Lafayette, IN

Tags

Unit Operations of Nanomanufacturing
  • Unit Operations of Nanomanufacturing 1. Unit Operations of Nanomanufac… 0
    00:00/00:00
  • Outline 2. Outline 82.315648982315651
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  • Nanomanufacturing? 3. Nanomanufacturing? 129.12912912912913
    00:00/00:00
  • Demands of Nanomanufacturing 4. Demands of Nanomanufacturing 258.324991658325
    00:00/00:00
  • Efficient Implementation of Nanomanufacturing Requires 5. Efficient Implementation of Na… 447.84784784784785
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  • Power of the Unit Operation Concept 6. Power of the Unit Operation Co… 634.40106773440107
    00:00/00:00
  • Unit Operations/Process Flow for Wire Grid Polarizers 7. Unit Operations/Process Flow f… 724.25759092425767
    00:00/00:00
  • NASCENT's R2R Unit Operations 8. NASCENT's R2R Unit Operations 789.45612278945612
    00:00/00:00
  • NASCENT's Wafer Scale Unit Operations 9. NASCENT's Wafer Scale Unit Ope… 923.35669002335669
    00:00/00:00
  • Roll to Roll Nanophotonics 10. Roll to Roll Nanophotonics 973.84050717384059
    00:00/00:00
  • Bit Patterned Media 11. Bit Patterned Media 1067.8011344678012
    00:00/00:00
  • Some Patterning Operations 12. Some Patterning Operations 1136.6366366366367
    00:00/00:00
  • Some Patterning Operations 13. Some Patterning Operations 1172.1388054721388
    00:00/00:00
  • UV Imprint Lithography 14. UV Imprint Lithography 1184.8181514848181
    00:00/00:00
  • Jet and Flash Imprint Lithography 15. Jet and Flash Imprint Lithogra… 1188.1881881881882
    00:00/00:00
  • Multi-Drop Squeeze Flow 16. Multi-Drop Squeeze Flow 1301.1011011011012
    00:00/00:00
  • Multiple Drop Filling 17. Multiple Drop Filling 1440.6406406406406
    00:00/00:00
  • Imprint Time – Applied Force 18. Imprint Time – Applied Force 1571.4714714714714
    00:00/00:00
  • Imprint Time - Feature Density 19. Imprint Time - Feature Density 1632.6659993326662
    00:00/00:00
  • UV Imprint in Practice 20. UV Imprint in Practice 1722.2555889222556
    00:00/00:00
  • Interface Motion Through Features 21. Interface Motion Through Featu… 1784.6846846846847
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  • Simulation Results 22. Simulation Results 1828.9289289289291
    00:00/00:00
  • Fill – No Fill Model 23. Fill – No Fill Model 1889.4227560894228
    00:00/00:00
  • Gas Trapping 24. Gas Trapping 1950.9175842509176
    00:00/00:00
  • R2R Nano-patterning for Flexible Electronics 25. R2R Nano-patterning for Flexib… 2046.3463463463465
    00:00/00:00
  • Configurations for R2R UV imprint 26. Configurations for R2R UV impr… 2067.0003336670006
    00:00/00:00
  • State of the art: R2R UV-IL 27. State of the art: R2R UV-IL 2215.7490824157489
    00:00/00:00
  • Which R2R Configuration is Best? Fastest speeds? Residual layer thickness? Processable substrates? 28. Which R2R Configuration is Bes… 2274.4411077744412
    00:00/00:00
  • Three Patterning Steps in R2R 29. Three Patterning Steps in R2R 2294.7280613947282
    00:00/00:00
  • Maximum web speed 30. Maximum web speed 2360.7607607607611
    00:00/00:00
  • Value of UV Imprint Simulations 31. Value of UV Imprint Simulation… 2446.37971304638
    00:00/00:00
  • Directed Self-Assembly of 32. Directed Self-Assembly of 2480.2135468802135
    00:00/00:00
  • Nanoparticles as Building Blocks 33. Nanoparticles as Building Bloc… 2485.5855855855857
    00:00/00:00
  • Why Directed Self-Assembly of Particles? 34. Why Directed Self-Assembly of … 2554.6212879546215
    00:00/00:00
  • Entropic Self-Assembly Needs Direction 35. Entropic Self-Assembly Needs D… 2606.0727394060727
    00:00/00:00
  • Simulation Methodology: DFT 36. Simulation Methodology: DFT 2634.5679012345681
    00:00/00:00
  • Without External Field 37. Without External Field 2672.405739072406
    00:00/00:00
  • Proposed Patterning 38. Proposed Patterning 2729.0957624290959
    00:00/00:00
  • External Field Disrupts HCP Formation 39. External Field Disrupts HCP Fo… 2791.9252585919253
    00:00/00:00
  • Increasing Barrier Height Sharpens Peaks 40. Increasing Barrier Height Shar… 2836.67000333667
    00:00/00:00
  • Increasing Bulk Density Sharpens Peaks 41. Increasing Bulk Density Sharpe… 2860.0934267600937
    00:00/00:00
  • Square Order Persists for Wall Separations Up To 10X Particle Diameter 42. Square Order Persists for Wall… 2903.4034034034034
    00:00/00:00
  • GC Monte Carlo Simulations Reveal Details of Defect Structure 43. GC Monte Carlo Simulations Rev… 2927.6609943276612
    00:00/00:00
  • Value of Simulations for DSA of Particles 44. Value of Simulations for DSA o… 3004.2709376042712
    00:00/00:00
  • UNIT OPERATIONS BENEFITS TO 45. UNIT OPERATIONS BENEFITS TO 3039.0390390390394
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  • Acknowledgements 46. Acknowledgements 3141.1745078411745
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  • Questions? 47. Questions? 3153.31998665332
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