ECE 695Q Lecture 22: Shaped-Electron-Beam Lithography

By Minghao Qi

Electrical and Computer Engineering, Purdue University, West Lafayette, IN

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Researchers should cite this work as follows:

  • Minghao Qi (2016), "ECE 695Q Lecture 22: Shaped-Electron-Beam Lithography," https://nanohub.org/resources/24445.

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226 Electrical Engineering, Purdue University, West Lafayette, IN

Tags

  1. electron beam
  2. lithography
  3. nanomanufacturing
ECE 695Q Lecture 22: Shaped-Electron-Beam Lithography
  • Lecture 22 Shaped-Electron-Beam Lithography 1. Lecture 22 Shaped-Electron-Bea… 0
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  • The Need for Shaped-Beam: Throughput 2. The Need for Shaped-Beam: Thro… 26.226226226226228
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  • Various Beam Profiles 3. Various Beam Profiles 233.33333333333334
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  • Fixed-shaped-beam imaging 4. Fixed-shaped-beam imaging 422.32232232232235
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  • Variable Shaped Beam Imaging 5. Variable Shaped Beam Imaging 521.22122122122119
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  • IBM's EL5 Shaped Beam System 6. IBM's EL5 Shaped Beam System 637.53753753753756
    00:00/00:00
  • Performance of the Latest Variable Shaped 7. Performance of the Latest Vari… 1173.6069402736071
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  • Character Aperture Shaping 8. Character Aperture Shaping 1236.4364364364365
    00:00/00:00
  • Vertical Landing of focused e-beam 9. Vertical Landing of focused e-… 1583.4167500834169
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  • Raster Shaped beam pattern generation 10. Raster Shaped beam pattern gen… 1812.0453787120455
    00:00/00:00
  • Image formation 11. Image formation 1993.7270603937272
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  • Results of Raster Shaped Beam 12. Results of Raster Shaped Beam 2190.3903903903906
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