ECE 595AL Lecture 10.2: Nanoimprint Lithography - Risidual Layer After Nanoimprint

By Minghao Qi

Electrical and Computer Engineering, Purdue University, West Lafayette, IN

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Researchers should cite this work as follows:

  • Minghao Qi (2020), "ECE 595AL Lecture 10.2: Nanoimprint Lithography - Risidual Layer After Nanoimprint," https://nanohub.org/resources/32816.

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EE 224, Purdue University, West Lafayette, IN

ECE 595AL Lecture 10.2: Nanoimprint Lithography - Risidual Layer After Nanoimprint
  • Lecture 10.2: Nanoimprint Lithography (I) - Residual Layer after Nanoimprint 1. Lecture 10.2: Nanoimprint Lith… 0
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  • Residue Layer 2. Residue Layer 17.517517517517518
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  • Residual layer: thinner is better for easier pattern transfer 3. Residual layer: thinner is bet… 97.163830497163829
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  • How to get rid of residual layer 4. How to get rid of residual lay… 189.28928928928929
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  • Etch Transfer after Imprint 5. Etch Transfer after Imprint 338.90557223890556
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  • ICP etching of residue layer 6. ICP etching of residue layer 413.41341341341342
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  • Another way to reduce residue layer effect 7. Another way to reduce residue … 443.34334334334335
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