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ECE 695A Lecture 10: NBTI Time Dependence -- Frequency and Duty Cycle Dependencies
Online Presentations | 06 Feb 2013 | Contributor(s):: Muhammad Alam
Outline:NBTI stress and relaxation by R-D modelFrequency independence and lifetime projectionDuty cycle dependenceThe magic of measurementConclusions
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ECE 695A Lecture 9: NBTI Time Dependence -- Stress Phase
Online Presentations | 06 Feb 2013 | Contributor(s):: Muhammad Alam
Outline:Background: Time-dependent degradationThe Reaction-Diffusion modelApproximate solution to R-D model in stress phaseDegradation free transistorsConclusions
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ECE 695A Lecture 8: Phenomenological Observations for NBTI
Online Presentations | 01 Feb 2013 | Contributor(s):: Muhammad Alam
Outline:Qualitative observationsTime, voltage, temperature dependenciesMaterial dependenceCircuit implications
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ECE 695A Lecture 8R: Review Questions
Online Presentations | 01 Feb 2013 | Contributor(s):: Muhammad Alam
What is the distinction between BTI and NBTI phenomena?What does it mean that a process is thermally activated?What is the difference between parametric failure and catastrophic failure? Give examples. What are the time-characteristics of trapping, BTI, and NBTI?Which device will have poorer NBTI...
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Siting Liu
https://nanohub.org/members/60600
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Esteve Amat
https://nanohub.org/members/52897
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On the Resolution of Ultra-fast NBTI Measurements and Reaction-Diffusion Theory
Online Presentations | 30 Dec 2009 | Contributor(s):: Ahmad Ehteshamul Islam, Souvik Mahapatra, Muhammad A. Alam
Reaction-Diffusion (R-D) theory, well-known to successfully explain most features of NBTI stress, is perceived to fail in explaining NBTI recovery. Several efforts have been made to understand differences between NBTI relaxation measured using ultra-fast methods and that predicted by R-D theory....
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Mobility Variation Due to Interface Trap Generation in Plasma Oxynitrided PMOS Devices
Online Presentations | 30 Jun 2008 | Contributor(s):: Ahmad Ehteshamul Islam, Souvik Mahapatra, Muhammad A. Alam
Mobility degradation due to generation of interfacetraps, Δµeff(NIT), is a well-known phenomenon that has beentheoretically interpreted by several mobility models. Based onthese analysis, there is a general perception that Δµeff(NIT) isrelatively insignificant (compared to Δµeff due to...
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Modeling Interface-defect Generation (MIG)
Tools | 18 Jul 2006 | Contributor(s):: Ahmad Ehteshamul Islam, HALDUN KUFLUOGLU, Muhammad A. Alam
Analyzes device reliability based on NBTI
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Spice3f4
Tools | 14 Aug 2005 | Contributor(s):: Michael McLennan
General-purpose circuit simulation program for nonlinear dc, nonlinear transient, and linear ac analysis
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Negative Bias Temperature Instability (NBTI)
Courses|'
22 Nov 2016
In this modular course, we will cover recent advances in Negative Bias Temperature Instability (NBTI), which is a crucial reliability issue for Silicon Oxynitride and High K Metal Gate PMOS...
https://nanohub.org/courses/NBTI