ECE 695Q Lecture 04: Contamination Control and Substrate Cleaning

By Minghao Qi

Electrical and Computer Engineering, Purdue University, West Lafayette, IN

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Researchers should cite this work as follows:

  • Minghao Qi (2016), "ECE 695Q Lecture 04: Contamination Control and Substrate Cleaning," https://nanohub.org/resources/24283.

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226 Electrical Engineering, Purdue University, West Lafayette, IN

Tags

  1. contamination control
  2. lithography
  3. nano fabrication
  4. nanomanufacturing
  5. processing
  6. substrate cleaning
ECE 695Q Lecture 04: Contamination Control and Substrate Cleaning
  • Lecture 4 Contamination Control and Substrate Cleaning 1. Lecture 4 Contamination Contro… 0
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  • Contaminants 2. Contaminants 27.560894227560894
    00:00/00:00
  • Contaminations & Counter-measures 3. Contaminations & Counter-measu… 110.84417751084418
    00:00/00:00
  • Semiconductor Wafer Cleaning Technology for CMOS Processing 4. Semiconductor Wafer Cleaning T… 184.1841841841842
    00:00/00:00
  • Cleaning post-gate features 5. Cleaning post-gate features 319.9532866199533
    00:00/00:00
  • Critical Components for cleaning of BEOL Structures 6. Critical Components for cleani… 403.13646980313649
    00:00/00:00
  • Critical Impurity Elements for Si Devices 7. Critical Impurity Elements for… 471.83850517183851
    00:00/00:00
  • Sources of Contamination 8. Sources of Contamination 539.3727060393727
    00:00/00:00
  • Air filtering 9. Air filtering 597.56423089756424
    00:00/00:00
  • Various Standards in Cleanroom Classification 10. Various Standards in Cleanroom… 682.38238238238239
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  • ISO 14644-1 cleanroom standards 11. ISO 14644-1 cleanroom standard… 729.06239572906247
    00:00/00:00
  • Cleanroom class comparison 12. Cleanroom class comparison 766.13279946613284
    00:00/00:00
  • Detection of Contaminations 13. Detection of Contaminations 780.54721388054725
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  • Wetting angles 14. Wetting angles 844.54454454454458
    00:00/00:00
  • Classification of Contamination and Defects 15. Classification of Contaminatio… 923.52352352352352
    00:00/00:00
  • Wafer Cleaning and Surface Conditioning Technology 16. Wafer Cleaning and Surface Con… 971.30463797130471
    00:00/00:00
  • Liquid Processes and Wafer Drying Techniques 17. Liquid Processes and Wafer Dry… 1086.3863863863865
    00:00/00:00
  • Removal of residual organics (including resists) 18. Removal of residual organics (… 1150.1835168501837
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  • H2SO4/H2O2 Mixtures (Piranha Etch) 19. H2SO4/H2O2 Mixtures (Piranha E… 1188.0547213880548
    00:00/00:00
  • RCA Standard Cleaning (RCA Cleaning) 20. RCA Standard Cleaning (RCA Cle… 1264.6980313646982
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  • SC-1 21. SC-1 1447.580914247581
    00:00/00:00
  • Mechanism to Remove Particles in SC-1 22. Mechanism to Remove Particles … 1539.83983983984
    00:00/00:00
  • Zeta Potential and the Double Layer 23. Zeta Potential and the Double … 1591.1244577911245
    00:00/00:00
  • z Potential vs pH 24. z Potential vs pH 1734.7681014347681
    00:00/00:00
  • Particle Adhesion 25. Particle Adhesion 1860.8942275608943
    00:00/00:00
  • The Capillary and van der Waals force vs particle size 26. The Capillary and van der Waal… 1934.8014681348016
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  • SC-2 27. SC-2 1976.9436102769437
    00:00/00:00
  • Improvements 28. Improvements 2037.9713046379713
    00:00/00:00
  • RCA Megasonic Cleaning System 29. RCA Megasonic Cleaning System 2211.8451785118455
    00:00/00:00
  • Megasonic Cleaning 30. Megasonic Cleaning 2247.8812145478814
    00:00/00:00
  • Megasonic/Ultrasonic Transducers 31. Megasonic/Ultrasonic Transduce… 2386.9536202869535
    00:00/00:00
  • Acoustic Streaming 32. Acoustic Streaming 2414.647981314648
    00:00/00:00
  • Magasonic Cleaning (II) 33. Magasonic Cleaning (II) 2469.3693693693695
    00:00/00:00
  • Dilemma between cleaning power and structure damage 34. Dilemma between cleaning power… 2508.8755422088757
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  • Dual-Transducer Megasonic Cleaning 35. Dual-Transducer Megasonic Clea… 2653.6870203536873
    00:00/00:00
  • Particle Removal 36. Particle Removal 2702.4024024024025
    00:00/00:00
  • Cryogenic Cleaning 37. Cryogenic Cleaning 2758.0914247580913
    00:00/00:00
  • Cryogenic Aerosol Cleaning 38. Cryogenic Aerosol Cleaning 2831.8651985318652
    00:00/00:00
  • Equipment 39. Equipment 2907.8745412078747
    00:00/00:00
  • Nozzle-based cleaning technology 40. Nozzle-based cleaning technolo… 2938.5051718385052
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  • Plasma source for rapid photoresist stripping 41. Plasma source for rapid photor… 2988.154821488155
    00:00/00:00
  • Brushless post oxide CMP cleaning 42. Brushless post oxide CMP clean… 3014.0473807140474
    00:00/00:00
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