ECE 695Q Lecture 32: Nanoimprint Lithography (NIL) – Overview and Thermal NIL Resists

By Minghao Qi

Electrical and Computer Engineering, Purdue University, West Lafayette, IN

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Researchers should cite this work as follows:

  • Minghao Qi (2016), "ECE 695Q Lecture 32: Nanoimprint Lithography (NIL) – Overview and Thermal NIL Resists," https://nanohub.org/resources/24956.

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226 Electrical Engineering, Purdue University, West Lafayette, IN

Tags

  1. lithography
  2. nano fabrication
  3. nanoimprint lithography
  4. processing
ECE 695Q Lecture 32: Nanoimprint Lithography (NIL) – Overview and Thermal NIL Resists
  • Lecture 32 Nanoimprint Lithography (NIL) – Overview and Thermal NIL Resists 1. Lecture 32 Nanoimprint Lithogr… 0
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  • Nanoimprint lithography (NIL) 2. Nanoimprint lithography (NIL) 19.81981981981982
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  • Nanoimprint: Mechanical Replication 3. Nanoimprint: Mechanical Replic… 39.806473139806478
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  • Two Approaches of NIL 4. Two Approaches of NIL 130.4637971304638
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  • Comparison 5. Comparison 427.69436102769436
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  • International Technology Roadmap for Semiconductors (ITRS) 6. International Technology Roadm… 863.39673006339672
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  • NIL always a candidate for IC Manufacturing 7. NIL always a candidate for IC … 918.48515181848518
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  • Key advantage of NIL: highest resolution 8. Key advantage of NIL: highest … 1146.946946946947
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  • Key advantage of NIL: extremely high resolution 9. Key advantage of NIL: extremel… 1194.4611277944612
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  • Another key advantage: 3D imprinting 10. Another key advantage: 3D impr… 1335.7357357357357
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  • Imprinting in presence of a dust particle 11. Imprinting in presence of a du… 1433.9005672339006
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  • Nanoimprint lithography (NIL) 12. Nanoimprint lithography (NIL) 1519.2192192192192
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  • Material and Mechanism of Thermal nanoimprint 13. Material and Mechanism of Ther… 1532.8661995328662
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  • Desired Resist Properties for NIL 14. Desired Resist Properties for … 1538.1715048381716
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  • Initial Resist Thickness 15. Initial Resist Thickness 1725.4587921254588
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  • First Resist for NIL: PMMA 16. First Resist for NIL: PMMA 1916.2495829162497
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  • Shear modulus of different molecular weight PMMAs 17. Shear modulus of different mol… 2044.1107774441109
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  • Another thermal NIL resist: TOPAS polymers 18. Another thermal NIL resist: TO… 2144.2776109442775
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  • Tg can be lowered by adding plasticizer into the resist 19. Tg can be lowered by adding pl… 2226.5932599265934
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  • Polymer with low Tg 20. Polymer with low Tg 2279.9466132799466
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  • If Tg is too low… 21. If Tg is too low… 2465.5321988655323
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  • Approach to thermal stability 22. Approach to thermal stability 2478.0447113780447
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  • Thermal and photochemical curing 23. Thermal and photochemical curi… 2529.5295295295296
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  • Imprinting thermally curing polymer mr-I 9000E 24. Imprinting thermally curing po… 2635.935935935936
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  • Fast iso-thermal nanoimprint lithography 25. Fast iso-thermal nanoimprint l… 2684.3510176843511
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  • Functional resist: nano-crystal(NC)/polymer based materials 26. Functional resist: nano-crysta… 2820.3536870203538
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  • Imprinting on luminescent nano-crystal/PMMA based co-polymer composites 27. Imprinting on luminescent nano… 2858.324991658325
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  • Functional 28. Functional "resist": semicondu… 2905.1718385051718
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