ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication
ME 290R Lecture 5: Nanoimprint Lithography – Stamp Fabrication
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1. Lecture 5: Nanoimprint lithogr… 0
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2. Design questions for a stamp F… 52.185518852185524
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3. Some example process flows for… 61.1277944611278
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4. Elastic stamp deformations 481.18118118118122
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5. Air cushion press: using wafer… 645.87921254587923
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6. Wafer bowing/bending to make c… 815.51551551551552
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7. Substrate Conformal Imprint Li… 891.725058391725
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8. "Rigiflex" stamps 1240.9409409409409
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9. Long-range compliance and shor… 1349.3159826493161
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10. Structured stamps 1471.0043376710044
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11. Even a small flexure-gap incre… 1554.4878211544879
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12. Simulations using a measured w… 1591.157824491158
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13. Simulations using a measured w… 1659.9265932599267
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14. Simulations using a measured w… 1837.6376376376377
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15. Die-scale simulations 1838.8388388388389
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16. Structured stamps also allow f… 1840.6740073406741
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17. Stamp bending to guide droplet… 1844.477811144478
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18. Multilevel stamps 1953.7871204537871
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19. Self-aligned Imprint Lithograp… 2014.3143143143143
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20. Self-aligned Imprint Lithograp… 2124.3576910243578
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21. Self-aligned imprint lithograp… 2271.7050383717051
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22. Capacity-equalized molds/stamp… 2303.9706373039708
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23. Stamps with integrated heaters… 2670.2369035702368
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