Stanford Virtual-Source Carbon Nanotube Field-Effect Transistors Model 1.0.0

By Chi-Shuen Lee1, H.-S. Philip Wong1

Stanford University

The VSCNFET model captures the dimensional scaling properties and includes parasitic resistance, capacitance, and tunneling leakage currents. The model aims for CNFET technology assessment for the sub-10-nm technology nodes.

Listed in Compact Models | publication by group NEEDS: New Era Electronic Devices and Systems

Additional materials available

Archive Version 1.0.0 - published on 30 Mar 2015 doi:10.4231/D38W3835S - cite this Last public release: 1.0.1

Licensed under NEEDS Modified CMC License according to these terms

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Description

The Stanford Virtual-Source Carbon Nanotube Field-Effect Transistors (VSCNFET) model is a semi-empirical compact model for CNFETs that captures the dimensional scaling properties and includes parasitic resistance, capacitance, and tunneling leakage currents. Inputs to the model are device design parameters such as gate length, gate oxide thickness, CNT diameter, and flat-band voltage. Experimental devices with the gate length down to 15 nm and numerical simulations based on the non-equilibrium Green’s function formalism are used for parameter extraction and model calibration. The model aims to assess the potentials of CNFET technology for the sub-10-nm technology nodes.

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Key References

C.-S. Lee, E. Pop, A. Franklin, W. Haensch, and H.-S. P. Wong, “A Compact Virtual-Source Model for Carbon Nanotube Field-Effect Transistors in the Sub-10-nm Regime—Part I: Intrinsic Elements,” arXiv:1503.04397

C.-S. Lee, E. Pop, A. Franklin, W. Haensch, and H.-S. P. Wong, “A Compact Virtual-Source Model for Carbon Nanotube Field-Effect Transistors in the Sub-10-nm Regime—Part II: Extrinsic Elements and Performance Assessment,” arXiv:1503.04398

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